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Plasma Dry Etch Engineer

Absolics · Covington, GAtodayverified 12 h ago
$90k – $150k

MS-level R&D / Research roles on Crosslinked list a median of $138k (107 that show pay).

Develop plasma etch, PVD seed deposition and plasma ablation processes for glass-substrate advanced packaging interconnects.

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Worth knowing

Why it is interesting. Primary technical owner of vacuum unit processes in an early-stage R&D effort building glass substrates with embedded elements for HPC.

Mostly at the benchDeep specialist PhD-friendly

Adjacent materials roleDevelop PVD seed deposition, plasma etch/ablation on organic dielectrics (ABF, PBO, polyimide); XPS/AES, SEM film characterization; adhesion control

Seniority
Mid-level
Work
On-site
Type
Full-time
Degree
MS
Experience
3+ yrs
Industry
Semiconductor
Role
R&D / Research
Benefits
6% 401K match with no vesting100% paid health/dental/visioncell phone allowance

Role details

Job Title: R&D Engineer - Dry Process (Plasma Etch /Plasma Ablation/ PVD) Expert for Advanced Packaging applications Location: Covington, GA Job Type: Full-Time About Us: Absolics is a leading provider of advanced packaging technologies and services, offering scalable solutions for businesses of high-performance computing. We offer smart, innovative services to dozens of clients globally. By dedicating our efforts to establishing large glass substrates with built-in active and passive elements, our goal is to provide significant improvement in signaling characteristics and power consumption compared to existing solutions.

Job Description: We are seeking a highly skilled and motivated Dry Process Engineer to join our R&D team. In this role you will lead development of dry processing capabilities across plasma etch, physical vapor deposition, and plasma-based ablation steps for fabricating advanced packaging interconnect structures. This role sits at the intersection of thin-film metallization and dielectric patterning, requiring you to steer equipment and process qualification, process recipe development, and integration handoffs with lithography, wet process, and plating teams.

You will be a primary technical owner for vacuum-based unit processes in a hands-on, early-stage R&D environment where design of experiment planning capabilities and rigorous root-cause analysis both matter.

Key Responsibilities

Develop and qualify plasma etch, PVD seed deposition, and plasma ablation processes for RDL build up and interconnect structures Help establish process flows that enable control of film uniformity, required via or trench step coverage and taper/sidewall profile, and layer-to-layer adhesion across the various plasma-based sub processes Establish recipes and tune plasma chemistry and tool parameters to optimize etch selectivity and minimize defects (micro-masking, residue, undercut) Perform root-cause and failure analysis on dry-process defects using SEM, XPS/AES, and electrical metrology Assess plasma-induced damage risk (charging, UV effects) on dielectrics and downstream reliability Collaborate with wet process and plating teams to ensure clean handoff of seed layers and trench/via structures Required Skills Hands-on experience with plasma etch process development (RIE, ICP, or barrel plasma) in a semiconductor or packaging environment Direct experience with PVD sputter deposition of seed layers (Ti, TiW, Ta, Cu) including thickness uniformity, step coverage, and adhesion control Experience with plasma-based dielectric ablation techniques/descum on organic or inorganic dielectrics (ABF, PBO, PSPI, polyimide) Working knowledge of plasma chemistry fundamentals (O₂, CF₄, SF₆, Ar, N₂ chemistries) and their etch selectivity tradeoffs Proficiency with vacuum system fundamentals: chamber pressure control, RF/ICP power coupling, gas flow control, end-point detection Metrology and characterization skills: SEM, profilometry, XPS or AES for surface composition, four-point probe for film resistivity DOE design and statistical analysis for process optimization (Minitab, JMP, or equivalent) Root-cause and failure analysis experience for etch defects (micro-masking, undercut, residue, via taper control) Preferred Skills Experience with plasma descum/etch-back for via clean prior to metallization (organic dielectric residue removal) Familiarity with PECVD or ALD for inorganic dielectric or barrier films (SiN, SiO₂, SiCN) Experience tuning trench taper angle, sidewall profile, and CD bias for fine-pitch micro structures (≤10 µm) Knowledge of dry plasma Ti seed removal as an alternative to wet etch (selectivity to underlying Cu RDL) Familiarity with plasma uniformity modeling, chamber matching, or tool-to-tool variation reduction Cross-process integration experience linking dry etch outcomes to downstream plating or CMP performance Experience with reliability impact assessment of plasma-induced damage (charging, UV exposure effects on dielectrics) Education Ph.D. in Materials Science, Electrical Engineering, Chemical Engineering, Physics, or related field preferred M.S. with 3+ years of relevant industry or research experience considered Benefits: 401K 6% matching (NO vesting period) Healthcare 100% support (Health, Dental, Vision) Life, STD, LTD 100 % support Cell phone allowance PTO and self-development SALARY: $90,000 – $150,000

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Common questions

What is the salary for the Plasma Dry Etch Engineer role at Absolics?

The listed annual base salary range is $90K–$150K. This figure is taken from the posting itself.

Does Absolics sponsor H-1B visas?

Absolics has filed H-1B petitions with the US Department of Labor in past years, but this specific posting does not explicitly mention sponsorship for the Plasma Dry Etch Engineer role. Confirm with the employer before applying if visa support is required.

Where is the Plasma Dry Etch Engineer role at Absolics based?

This role is based in Covington, GA.

What degree is required for the Plasma Dry Etch Engineer role at Absolics?

The posting accepts the following combinations: MS + 3 years, PhD + 0 years.

How many years of experience does this Plasma Dry Etch Engineer role require?

The posting calls for at least 3 years of relevant experience.

What polymers or materials does this Plasma Dry Etch Engineer role work with?

Ti, TiW, Ta, Cu, ABF, PBO, PSPI, polyimide.

What techniques or methods are required for this Plasma Dry Etch Engineer role?

SEM, XPS/AES, profilometry, four-point probe, end-point detection.